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Process C (lower RTP-1 Soak + DSA RTP-2) achieves lowest roughness T1 Soak T2 Soak T1-40ºC Soak T2 Soak T1-40ºC Soak T2 + 400ºC DSA Source: IEEE - RTP2009 Conference, Advances on 32nm NiPt Salicide Process, Dr. Chen et al. Co-published by UMC / Applied Materials RTP-1 anneal: RTP-2 anneal: RTP-1 anneal: RTP-2 anneal: RTP-1 anneal: RTP-2 anneal: jam 138 rtp